TY - JOUR KW - Anti-Infective Agents KW - Drug Resistance, Multiple, Bacterial KW - Drug Therapy, Combination KW - Humans KW - Leprostatic Agents KW - leprosy KW - Levofloxacin KW - Ofloxacin AU - Gidoh M AU - Namisato M AU - Kumano K AU - Goto M AU - Nogami R AU - Ozaki M AU - Commitee for standards on therapeutic usage of newquinolones AB -

Ofloxacin(OFLX) is often applied today as a substitution drug of MDT for drug resistance to dapsone, rifampicin or clofazimine. However, OFLX resistance is also becoming a great concern. Low and/or irregular administration are considered to be the major causes of OFLX resistance. OFLX should be used as a combined therapy, and minimal daily dose of 400 mg of OFLX or 200-300 mg of levofloxacin is required. Quinolone resistance should be considered when no improvement of clinical and/or bacterial index is observed after the treatment for 6 months. In such cases, resistance gene detection is necessary.

BT - Nihon Hansenbyo Gakkai zasshi = Japanese journal of leprosy : official organ of the Japanese Leprosy Association C1 - http://www.ncbi.nlm.nih.gov/pubmed/15035068?dopt=Abstract DA - 2004 Feb IS - 1 J2 - Nihon Hansenbyo Gakkai Zasshi LA - jpn N2 -

Ofloxacin(OFLX) is often applied today as a substitution drug of MDT for drug resistance to dapsone, rifampicin or clofazimine. However, OFLX resistance is also becoming a great concern. Low and/or irregular administration are considered to be the major causes of OFLX resistance. OFLX should be used as a combined therapy, and minimal daily dose of 400 mg of OFLX or 200-300 mg of levofloxacin is required. Quinolone resistance should be considered when no improvement of clinical and/or bacterial index is observed after the treatment for 6 months. In such cases, resistance gene detection is necessary.

PY - 2004 SP - 65 EP - 7 T2 - Nihon Hansenbyo Gakkai zasshi = Japanese journal of leprosy : official organ of the Japanese Leprosy Association TI - [Guideline for the treatment of leprosy by new quinolones]. VL - 73 SN - 1342-3681 ER -